http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07122524-A

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filingDate 1994-08-12^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69452c908a5e9c14a0d21f5ef99f56ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9717bcd10c563301db2683af0363e611
publicationDate 1995-05-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07122524-A
titleOfInvention Work holder for a rotary grinding machine for grinding a semiconductor wafer and method for positioning the work holder
abstract (57) [Abstract] [PROBLEMS] To provide an apparatus and method by which the relative spatial position between the rotation axis of a grinding tool and the rotation axis of a work can be easily adjusted with high accuracy. A work holder 1 for a rotary grinding machine for grinding a semiconductor wafer 10, the work holder 1 having a working surface 9 facing a rotary grinding tool and on which a semiconductor wafer 10 to be processed is placed, , The piezoelectric element 2 for axially supporting the work holder 1. The piezoelectric elements 2 can be actuated independently of each other, their linear dimensions change during actuation, and the actuated piezoelectric elements 2 move the work holder up and down in the axial direction at the position where it supports the work holder 1. .
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015150642-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012101307-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1110498-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015036166-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000173961-A
priorityDate 1993-10-21^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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