http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07169939-A

Outgoing Links

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filingDate 1994-11-28^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b30852dc6db2e98125a68fa32253cbd
publicationDate 1995-07-04^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07169939-A
titleOfInvention Semiconductor device
abstract (57) [Abstract] [PROBLEMS] To provide a semiconductor device capable of preventing a decrease in withstand voltage of an oxide film between an extraction electrode and a semiconductor substrate due to diffusion of an aluminum component of the extraction electrode into an oxide film. A base 2 and an emitter 3 are formed from a part of the surface of the semiconductor substrate 1 toward the inside, and an oxide film 4 is formed on the surface of the semiconductor substrate 1 in a range including the base 2 and the emitter 3. An extraction electrode made of aluminum, which is connected to each of the base 2 and the emitter 3 through a contact hole opened in, is formed outside the formation range of the base 2 and the emitter 3. A polysilicon layer 7 is interposed between the oxide film 4 and the extraction electrodes 5 and 6 so as to partially protrude from the formation range of the extraction electrodes 5 and 6 outside the formation range of the base 2 and the emitter 3.
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priorityDate 1994-11-28^^<http://www.w3.org/2001/XMLSchema#date>
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