| abstract |
(57) [Summary] [Purpose] To prevent deactivation of chemically amplified resist. Prevents charging during exposure to charged radiation. [Structure] After coating a chemically amplified resist, baking is performed at a temperature of 110 ° C. or higher, and (a) sulfonated polyaniline having a sulfo group content of 20 to 80% with respect to the aromatic ring is added to 0.1 to 20 weight. Parts, (b) 100 parts by weight of solvent, (C) 0.01 amines and / or quaternary ammonium salts In 10 to 10 parts by weight, (d) (A) sulfone group-containing compound and / or (B) sulfone group-containing polymer 0.001-100 11 parts by weight of the conductive agent forming composition is applied, and A method of baking at a temperature of 0 ° C. or higher, followed by exposure to charged radiation and development. The above composition. |