http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07235481-A

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filingDate 1994-02-25^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea88fa15780b8fcb074a5e8c3048c3e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f82864ee66551dd73d7d30525767f81d
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publicationDate 1995-09-05^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07235481-A
titleOfInvention Thin film manufacturing method
abstract (57) [Summary] [Structure] In a method for supplying a vaporized catalyst and a monomer into a reactor to produce a thin film on a substrate, after mixing the catalyst and the monomer, the mixture is supplied to the reactor. A method of manufacturing a thin film, comprising: [Effect] By mixing the catalyst and the monomer and supplying them to the reactor, the in-plane film thickness uniformity of the obtained thin film is excellent even when the reactor is made particularly small. Further, the utilization rate of the monomer can be improved by heating and elevating at least the catalyst, the mixed portion of the monomer, and the gas supply path from the mixed portion to the reactor in the gas supply pipe of the vaporized catalyst. .
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016517633-A
priorityDate 1994-02-25^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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