| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1996-06-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_720b4631a01f3b968937db6f3d93751b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d11ba13d468d5f3ce251a85df656edf8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f8cdcb3666e03b4813f8a1a61316f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_159a292d41eba6c08938471aa49d90b7 |
| publicationDate |
1997-12-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H09325498-A |
| titleOfInvention |
Photosensitive composition |
| abstract |
(57) Abstract: [Photosensitive material suitable as a resist material, which has high optical transparency to ultraviolet rays of extremely short wavelength, particularly ArF excimer laser, has excellent alkali solubility and has sufficient dry etching resistance. A sex composition is provided. A polymer having at least one aliphatic cyclic compound selected from cyclohexane and isobornyl in the main chain and having an acidic substituent introduced into the side chain of the aliphatic cyclic compound is contained. Characterize. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010524224-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9678426-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9678425-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8716385-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8420289-B2 |
| priorityDate |
1996-06-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |