http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H098012-A

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filingDate 1995-06-21^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86930726bc199faf2fb28a0b02b5515d
publicationDate 1997-01-10^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H098012-A
titleOfInvention Etching equipment for semiconductor manufacturing
abstract (57) [Abstract] [Purpose] An etching apparatus for semiconductor manufacturing, which can stabilize the etching process by keeping the temperature of the carbon electrode constant and controlling the supply amount of carbon from the carbon electrode to the plasma. I will provide a. In an etching apparatus having a carbon electrode 2 in a reactor chamber 1 and having a cooling device 11 for cooling the carbon electrode and a control device 14 for the cooling device, the temperature of the carbon electrode 2 is directly detected. A temperature sensor 3 and a heat insulating material 4 that covers the outer peripheral portion of the temperature sensor 3 in order to prevent thermal influence from a portion other than the carbon electrode 2 on the temperature sensor are provided, and the temperature sensor 3 and the CPU 14 are connected to each other. The cooling device 11 is controlled based on the detection output of the sensor 3.
priorityDate 1995-06-21^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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