| abstract |
PROBLEM TO BE SOLVED: To provide a memory hard disk capable of obtaining a polished surface having a high polishing rate and a small surface roughness and capable of preventing generation of fine projections, fine pits and other surface defects. Provision of a polishing composition. A polishing composition for a memory hard disk, comprising at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride, and manganese dioxide, and water. A polishing composition for a memory hard disk, further comprising an iron compound dissolved in the composition, and a method for producing a memory hard disk using the polishing composition. |