http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1022216-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 1996-07-02^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5550bb563997559c30979a3e6f92666
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2653e5aa4c0e8b8c5894f4a335309387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c1a3186ef9982494127cbe7ae5bdefc
publicationDate 1998-01-23^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1022216-A
titleOfInvention Exposure equipment for integrated circuit manufacturing
abstract (57) Abstract: Even when an ArF excimer laser exposure apparatus is configured using an optical system made of hydrogen-doped quartz glass, the cost of the entire optical system is reduced without deteriorating durability and quality. And easily manufactured. SOLUTION: At least a lens constituting an optical system is constituted by a synthetic quartz glass optical member doped with hydrogen, and the lens is constituted by a plurality of kinds of quartz glass optical members having different hydrogen molecule concentrations. The hydrogen molecule concentration C H2 (molecules / cm 2 ) of the optical member group is expressed by ε <0.2 mJ, where ε (mJ / cm 2 ) is the energy density per pulse of ArF excimer laser light transmitted through the corresponding lens. / Cm 2 , the equation 19.2 + 2.98 Logε ≦ Log (C H2 ) <18.6 1) For ε ≧ 0.2 mJ / cm 2 , the formula 19.2 + 2.98 Logε ≦ Log (C H2 ) ≦ 20.7 + 2.98 Lo gε... 2).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004511092-A
priorityDate 1996-07-02^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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