http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11209199-A

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filingDate 1998-01-26^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2376840620a4bc6a3ba3c430892c5848
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publicationDate 1999-08-03^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H11209199-A
titleOfInvention Synthesis method of GaN single crystal
abstract [PROBLEMS] To grow a large-sized, high-quality GaN epitaxial film at high speed. SOLUTION: Two temperature regions T 1 and T 2 are formed in a gas containing a nitrogen atom, and the temperature of each region is set to T 1 <T 2. And Low temperature range T 1 to a solid of the Ga source 8 is placed each GaN seed crystal or GaN single crystal substrate 13 to the high temperature region T 2. Evaporated Ga from the low temperature area T 1, the evaporated and Ga is reacted with the nitrogen components in the gas to form a GaN forming gas, a GaN forming gas of high temperature region T 2 of the seed crystal or GaN single crystal substrate 13 And a GaN single crystal is synthesized.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017109891-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012091967-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010269968-A
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priorityDate 1998-01-26^^<http://www.w3.org/2001/XMLSchema#date>
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