http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11209614-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 |
| filingDate | 1998-01-30^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ef0cacd9d4c8c83934baf8653b0a6ee |
| publicationDate | 1999-08-03^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11209614-A |
| titleOfInvention | Photosensitive polyimide precursor composition and pattern manufacturing method using the same |
| abstract | PROBLEM TO BE SOLVED: To develop with an aqueous solution, particularly excellent in developability with an aqueous solution, excellent photosensitive characteristics, particularly excellent in i-line photosensitive characteristics, high sensitivity, and good even at low exposure dose. A photosensitive polyimide precursor composition having a shape pattern, a high residual film ratio after development, and excellent cured film properties, and a manufacturing process using such a composition can be shortened, thereby reducing manufacturing costs. Provided is a method for manufacturing a pattern. SOLUTION: The photosensitive polyimide precursor composition containing a photosensitive polyimide precursor having a photosensitive group and an acidic group, a photosensitizer and, if desired, an addition polymerizable compound having a boiling point of 100 ° C. or more at normal pressure is prepared. To form a coating having a dissolution rate in a basic aqueous solution of 0.01 to 0.5 μm / sec, and irradiating the coating with light through a photomask. And develop. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10450417-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017110982-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017110982-A1 |
| priorityDate | 1998-01-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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