http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1194853-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7f278bf3e3bd12896f71fc0e87dd1684 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q60-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B7-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q40-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q90-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q60-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q60-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01D3-00 |
| filingDate | 1997-09-22^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8416d2369a2eeea63c31d29a715c9c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_941f7aa9f66a8c0f8c17bff271cd7986 |
| publicationDate | 1999-04-09^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1194853-A |
| titleOfInvention | Scanning probe microscope and quality control method using the same |
| abstract | (57) [Problem] To provide a scanning probe microscope capable of observing a probe for observing a sample surface without being affected even if it is slightly damaged. An atomic force microscope (1A) controls a sample wafer (3) mounted on a sample stage (2) with a cantilever provided with a sharp needle as a probe, a head section (4) including an electric circuit, and control for measurement. And a conventional atomic force microscope in which a computer processing unit 5 for performing data processing is arranged. A standard control strip 6 is placed on the sample stage 2 and a computer processing unit 7 for performing control for measuring the standard control strip 6 and comparing data is added. And The standard control piece 6 is interrupted during the measurement of the sample wafer 3, and the measured value of the sample wafer 3 is standardized data based on the measured value of the standard control piece 6, and the probe slightly wears and changes. In this case, the quality of the sample wafer 3 is determined without error. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016520216-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005297185-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011089985-A |
| priorityDate | 1997-09-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758 |
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