http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5522877-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-331 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate | 1978-08-08^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64e7f5cdb1edf9cecbf3a3b8c78b5e4d |
| publicationDate | 1980-02-18^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S5522877-A |
| titleOfInvention | Forming method for electrode protective film in semiconductor device |
| abstract | PURPOSE: To improve a characteristic of a protective film by coating a photoresist of a desirable film on an electrode wiring directly to be exposed to an O 2 plasma. n CONSTITUTION: A photoresist film 9 is formed on a wiring layer 7 of a base 2 and emitter 3 to shape a desirable configuration it by a photoprinting. When, for example, a plasma is generated under an O 2 pressure of 1Torr, at 3.56MHz and 200W, and the film 9 is exposed for 30 seconds, the surface is partially ashed, and the hardening is promoted by raising of a temperature in the surface and oxidation due to active oxygen. When a plasma processing time is too short, the hardening is unsufficinet, while too long, the film thickness is reduced, and hence a cautious processing is desired. According to such a process, an etching process to the protective film can be eliminated, the electrode surface is not suffered from any damage with reduction of a work process, and as a result the characteristics of the device can be stabilized. n COPYRIGHT: (C)1980,JPO&Japio |
| priorityDate | 1978-08-08^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID1969 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291 |
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