http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6019554-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-335 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H04N1-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L49-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01C7-00 |
| filingDate | 1983-07-13^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea10476e752f4ec7403379bcb1dfa819 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec064a2d142eb94f0b4cd89eb37f5225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dee1d5871056f2b899c7d49f7797ca60 |
| publicationDate | 1985-01-31^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S6019554-A |
| titleOfInvention | Thermal head for thermosensitive recording |
| abstract | PURPOSE:To enable the preparation of a low-cost head by arranging a silicon carbide film, a silicon nitride film or a mixed film of silicon carbide and silicon nitride on a heat generating body substrate and a heat generating body, a feed conductor and a protective film on the film. CONSTITUTION:An electrically insulating material layer 2 such as glass layer is provided on an electrically insulating substrate 1 with a less heat conductivity than the substrate material to form a heat generating body substrate. A silicon carbide film, a silicon nitride film or a mixed film of silicon carbide and silicon nitride (an etching prevention film)7 is provided on the heat generating body substrate and additionally, a heat generating body 3, a feed conductor and a protective film 6 are provided thereon to consruct a thermal head for heat-sensitive recording. As mentioned above, the film of silicon carbide or the like is used as an etching prevention film of the glass layer to enable the preparation of an inline continuous film for a resistor film. |
| priorityDate | 1983-07-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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