http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S62250510-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44b2ac87aeadb161b83426d9cf6c4bdc |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-738 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-64 |
filingDate | 1986-04-23^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b06b307f43571d9106f61a7ebbba60f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e98ac9e1754e4cf9f47c7fdf6dd67e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc90c3c19f91f1ed43c72ed1f2368c3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_561bfb3066df267c882ce577045c97c3 |
publicationDate | 1987-10-31^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-S62250510-A |
titleOfInvention | Magnetic recording medium |
abstract | PURPOSE: To obtain a magnetic recording medium which has the excellent durability, wear resistance, weatherability, corrosion resistance, etc., of the medium, obviates the attraction of a head and has extremely high reliability at the time of use by subjecting the surface of a layer to be directly provided with a carbon protective film or the surface of said layer and the surface of the carbon protective film to a plasma treatment. n CONSTITUTION: The surface of the layer to be directly provided with the carbon protective film 7 or the surface of said layer and the surface of the carbon protective film 7 are subjected to the plasma treatment. The inside of a reaction vessel R is evacuated and thereafter, a treating gas is supplied at a prescribed flow rate in a mixed state into the vessel. The vacuum in the reaction vessel is controlled to a 0.01W10Torr range in this stage. A frequency variable type power source is turned on and a material 111 to be treated is subjected to the plasma treatment when the transfer speed of the material 111 and the flow rate of the treating gas stabilize. There is no particular limitation for the plasma treating gas. n COPYRIGHT: (C)1987,JPO&Japio |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02126418-A |
priorityDate | 1986-04-23^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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