| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3471
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-547 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 |
| filingDate |
2013-04-04^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-07-28^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2014030382-A1 |
| titleOfInvention |
Deposition method |
| abstract |
A film forming method for forming an organic layer composed of a fluorine-containing resin on a substrate, wherein a vapor deposition film forming step of forming the organic layer as a vapor deposition film; a film thickness measurement step of measuring a film thickness of the vapor deposition film; A determination step of determining a parameter to be fed back so as to correct the conditions of the deposited film formation step based on the measurement result of the film thickness. |
| priorityDate |
2012-08-24^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |