http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016103850-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2015-10-08^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-04-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2016103850-A1 |
| titleOfInvention | Novolac type phenolic resin, photosensitive composition, resist material, coating film, and resist coating film |
| abstract | Provided is a novolac type phenolic resin and the like suitable for obtaining a coating film which is excellent in flexibility even in the case of a thick film and which is excellent in heat resistance, alkali developability, sensitivity and resolution. Specifically, at least one phenol trinuclear compound (A) selected from the group consisting of the compound represented by the general formula (1) and the compound represented by the general formula (2) (A) and monoaldehydes ( Provided is a novolak-type phenol resin obtained by reacting B) with a polyaldehyde (C) in the presence of an acid catalyst. [Wherein R 1 , R 2 and R 3 each independently represents an alkyl group having 1 to 8 carbon atoms which may have a substituent, and R 4 has a hydrogen atom or a substituent. Represents an optionally substituted alkyl group or an optionally substituted aryl group, p and q are each independently an integer of 1 to 4, r is an integer of 0 to 4, and s is 1 or 2. However, the sum of r and s is 5 or less. ] |
| priorityDate | 2014-12-24^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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