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filingDate 2017-01-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-08-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2017122716-A1
titleOfInvention Electrostatic chuck device and method of manufacturing electrostatic chuck device
abstract A base body on which a sintered body of ceramic particles including silicon carbide particles and aluminum oxide particles is used as a forming material, and one main surface is a mounting surface on which a plate-like sample is mounted, and the above-mentioned base surface is opposite to the mounting surface described above An electrode for electrostatic attraction provided on the side surface or inside the substrate, and the volume resistivity of the sintered body is 0.5 × 10 15 Ωcm in the entire range from 24 ° C. to 300 ° C. Above, the graph showing the relationship of the volume resistivity value of the sintered body to the measurement temperature of the volume resistivity value of the sintered body has a maximum value in the range from 24 ℃ to 300 ℃, The electrostatic chuck device, wherein a metal impurity content other than aluminum and silicon in the sintered body is 100 ppm or less.
priorityDate 2016-01-12^^<http://www.w3.org/2001/XMLSchema#date>
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