http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019038892-A1

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filingDate 2017-08-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-04-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2019038892-A1
titleOfInvention Group 13 element nitride layer, free-standing substrate and functional device
abstract PROBLEM TO BE SOLVED: To reduce the dislocation density in a group 13 element nitride crystal layer made of gallium nitride, aluminum nitride, indium nitride or a mixed crystal of group 13 element nitrides and having a top surface and a bottom surface, Provide a microstructure capable of reducing variations in characteristics over the entire length. SOLUTION: When an upper surface 13a of a group 13 element nitride crystal layer 13 is observed by cathodoluminescence, it has a linear high-brightness light emitting part 5 and a low-brightness light emitting region 6 adjacent to the high-brightness light emitting part 5. . The half width of (0002) plane reflection of the X-ray rocking curve on the upper surface 13a is 3000 seconds or less and 20 seconds or more. [Selection diagram]
priorityDate 2017-08-24^^<http://www.w3.org/2001/XMLSchema#date>
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