http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019050047-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2018-09-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-10-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2019050047-A1 |
| titleOfInvention | Phenolic resin composition for photoresist and photoresist composition |
| abstract | The mass of the novolak-type phenolic resin (A) represented by the general formula (1) and the novolac-type phenolic resin (B) containing at least one of an arylene skeleton and a naphthalene skeleton in the structure (A) and (B). A phenolic resin composition for a photoresist, which comprises an amount having a ratio of 5 to 95: 95 to 5. [Chemical 1] (In the general formula (1), R 1 represents hydrogen or a linear or branched alkyl group having 1 or more and 8 or less carbon atoms, which may be the same or different from each other, but at least R 1 . One is a linear or branched alkyl group having 1 or more and 8 or less carbon atoms. P is 1 or more and 3 or less, and they may be the same or different. Q is 1 or more and 3 or less. Yes, they may be the same or different, respectively. However, p + q ≦ 4. n represents an integer of 0 or more.) |
| priorityDate | 2017-09-11^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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