http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019181539-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02104 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 |
| filingDate | 2019-03-07^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-01-07^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2019181539-A1 |
| titleOfInvention | Substrate processing equipment, semiconductor equipment manufacturing methods and programs |
| abstract | An object of the present disclosure is to provide a technique capable of reliably suppressing the combustion of flammable gas in the subsequent stage of a vacuum pump. The processing chamber that processes the substrate, the gas supply system that supplies the raw material gas to the processing chamber, the exhaust pipe that is connected to the vacuum pump and exhausts the processing chamber, and the concentration of the raw material gas that passes through the exhaust pipe in the previous stage of the vacuum pump. A gas concentration measuring device for measuring, a pressure measuring device for measuring the pressure in the exhaust pipe in the rear stage of the vacuum pump, and a diluting gas supply system for supplying the diluting gas in the vacuum pump or in the exhaust pipe in the front stage of the vacuum pump. It is configured so that the diluting gas supply system can be controlled so that the diluting gas having a flow rate corresponding to the concentration of the raw material gas and the pressure in the subsequent stage of the vacuum pump is supplied into the exhaust pipe in the vacuum pump or the previous stage of the vacuum pump. A technology comprising a control unit is provided. |
| priorityDate | 2018-03-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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