http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100221215-B1

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filingDate 1994-12-27^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1999-09-15^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45c500b4400d7b9176a21a0ad0d0bd09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7c4e4231d125f3446eef4963f6209a0
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publicationDate 1999-09-15^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100221215-B1
titleOfInvention Metal oxide thin film pattern forming composition and metal oxide thin film pattern forming method
abstract One or two or more hydrolyzable metal compounds selected from hydrolyzable organometallic compounds (e.g., metal alkoxides) and metal halides, and water generators (e.g., 0-nitrobenzyl alcohols) that liberate water by irradiation with active rays , 2-nitroethanol) and, in some cases, an acid generator which liberates acid by actinic radiation, are applied onto the substrate, and the actinic radiation for image formation is carried out with the obtained photosensitive coating film. The unexposed portion is removed by developing with water or an alcohol solvent, and the substrate is heat-treated to convert the remaining coating film into a metal oxide, thereby forming a negative metal oxide thin film pattern.
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priorityDate 1993-12-27^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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