http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100803252-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13712 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133514 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133512 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133707 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-137 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-00 |
| filingDate | 2001-01-11^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-02-13^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-02-13^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100803252-B1 |
| titleOfInvention | Liquid crystal display and manufacturing method |
| abstract | An object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same, which can obtain better display quality than in the prior art.n n n The vertical alignment liquid crystal 29 is enclosed between the TFT substrate 10 and the CF substrate 20. The pixel electrode 16a provided with the slit 16b is formed in the TFT substrate 10, and the cell gap holding spacer 25a and the domain regulating protrusion 25b are formed in the CF substrate 20. For example, a positive photoresist is applied over the common electrode 24. Next, the first exposure is performed using a mask for shielding the spacer formation region and the projection formation region, and then the second exposure is performed using a mask for shielding the spacer formation region. Next, by developing the photoresist, spacers 25a and protrusions 25b having different heights can be formed at the same time. |
| priorityDate | 2000-01-14^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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