http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101094976-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-332 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3222 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32559 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32458 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-34 |
| filingDate | 2009-02-06^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-12-20^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-12-20^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101094976-B1 |
| titleOfInvention | Plasma processing equipment |
| abstract | By defining the positional relationship between the dielectric and the slot and defining the optimum shape of the top plate according to the material, a plasma processing apparatus having better plasma ignition stability and ignition stability is provided. The plasma processing apparatus 11 has a processing container 12 having an upper opening and inclined surfaces 16a and 16b that are inclined so that the thickness dimension is continuously changed on the lower surface thereof, so as to close the upper opening of the processing container 12. The dielectric 15 is disposed, and the antenna 24 is disposed on the upper surface of the dielectric 15 to supply microwaves to the dielectric 15 to generate plasma on the lower surface of the dielectric 15. The antenna 24 has a plurality of slots 25 located vertically above the inclined surfaces 16a and 16b. In addition, the plasma processing apparatus 11 includes a processing container 12 having an upper opening, a ring-shaped groove 16 on a lower surface thereof, and a dielectric 15 disposed to close the upper opening of the processing container 12. And an antenna 24 for supplying microwaves to the dielectric material 15 and generating plasma on the lower surface of the dielectric material 15. If the light flux is c, the microwave frequency is f, and the relative dielectric constant of the material constituting the dielectric 15 is εr, the groove width w of the groove satisfies [Equation 1].n n n [Equation 1] |
| priorityDate | 2008-02-08^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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