| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3327 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-358
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3457
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3411
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 |
| filingDate |
2004-06-22^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-05-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2012-05-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101138566-B1 |
| titleOfInvention |
Sidewall magnets and shields used in them to increase the uniformity of inductively coupled plasma |
| abstract |
One aspect of the present invention includes an auxiliary magnet ring located outside the chamber wall of the plasma sputtering reactor and arranged at least partially radially outwardly of an RF coil used to induce plasma generation, in particular for sputter etching a sputter deposited substrate. to be. Thus, the magnet film prevents the plasma from leaking out of the coil and improves the uniformity of the sputter etching. The magnetic field can act as a magnetron when the coil is made of a material of the same aspect as the material of the main target and is used as the second target. Another aspect of the invention includes a single part inner shield extending from the target to the base and having a flat surface and supported by an annular flange at the shield center portion. The shield can be used to support the RF coil. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150129758-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102217871-B1 |
| priorityDate |
2003-06-26^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |