| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2010-09-20^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-03-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-03-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101241143-B1 |
| titleOfInvention |
An article of manufacture having a photoresist composition, a method of forming a photoresist relief image, and a coating layer of the photoresist composition |
| abstract |
The resists of the present invention contain additive acid components that have been found to significantly improve stability during storage during manufacture and use. Preferred resists of the present invention contain ester solvents such as ethyl lactate or propylene glycol methyl ether acetate in addition to the acid component. |
| priorityDate |
2001-08-15^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |