http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101272564-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-507 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate | 2010-01-28^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-06-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-06-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101272564-B1 |
| titleOfInvention | Thin film forming apparatus and thin film forming method |
| abstract | The thin film forming apparatus controls the pressure of the 1st internal space in a film-forming container, and the 2nd internal space provided in this 1st internal space, respectively under the defined pressure condition. The apparatus generates a plasma in the second inner space by flowing source gas on the substrate in the second inner space, and by applying a high frequency power to the plasma generating source provided in the first inner space according to the pressure condition. A thin film is formed on the substrate. |
| priorityDate | 2009-02-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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