http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101333693-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L77-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2009-12-10^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-11-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-11-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101333693-B1 |
| titleOfInvention | Positive photosensitive resin composition |
| abstract | The present disclosure relates to a positive photosensitive resin composition, which comprises: (A) a polyamide polymer represented by the following general formula (1); (B) an esterified quinone diazide compound; (C) crown ether compounds; And (D) a solvent.n n n [Formula 1]n n n n n n n n (The definition of each substituent in Formula 1 is the same as defined in the specification.)n n n Also provided is a resin film and a semiconductor device manufactured using the positive photosensitive resin composition.n n n n Positive, photosensitive resin composition, polyamide, semiconductor element protective film, crown ether compound, aqueous alkali solution |
| priorityDate | 2009-12-10^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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