| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a31c3c574a8056fd9bb03c6c4d9cb298 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2012-12-28^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-05-12^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d0151bed5d9a7660885dd0ae103261
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb930e602acb4067390afec85a5b27db |
| publicationDate |
2014-05-12^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101393466-B1 |
| titleOfInvention |
Plasma processing apparatus |
| abstract |
The plasma ion source unit of the plasma processing apparatus according to the present invention includes a housing having an outlet through which a plasma ion is injected at a lower portion and a process gas supply unit through which a process gas is supplied, And a guide portion for guiding the process gas to a central portion of the plasma ion generating region, so as to prevent particles from being generated inside the plasma ion source unit . |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020149463-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101986834-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102298320-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200089583-A |
| priorityDate |
2012-12-28^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |