http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101608119-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-20 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate | 2013-01-11^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2016-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2016-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-101608119-B1 |
titleOfInvention | Polishing pad |
abstract | The present invention relates to a polishing pad excellent in moisture resistance and water resistance and a method for producing the same. Exemplary polishing pads can secure an excellent adhesive force between the polishing layer and the pressure-sensitive adhesive layer even in a polishing process under a humid atmosphere or an aqueous environment, for example, by a polishing liquid. |
priorityDate | 2013-01-11^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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