http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101608119-B1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
filingDate 2013-01-11^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-03-31^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-03-31^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101608119-B1
titleOfInvention Polishing pad
abstract The present invention relates to a polishing pad excellent in moisture resistance and water resistance and a method for producing the same. Exemplary polishing pads can secure an excellent adhesive force between the polishing layer and the pressure-sensitive adhesive layer even in a polishing process under a humid atmosphere or an aqueous environment, for example, by a polishing liquid.
priorityDate 2013-01-11^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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