| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24364
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022466
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-355
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-32 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5813
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022466
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3678 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-23 |
| filingDate |
2010-06-04^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-11-18^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-11-18^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101677783-B1 |
| titleOfInvention |
Method for depositing a thin film, and resulting material |
| abstract |
The present invention provides a method of manufacturing a substrate having a first surface coated with at least one transparent electrically conductive thin film containing at least one oxide, the method comprising: depositing the at least one thin film on the substrate; The one or more thin films are subjected to a thermal treatment step of irradiating the at least one film with radiation having a wavelength of 500 to 2000 nm concentrated on one area of the at least one film, the one or more dimensions of which do not exceed 10 cm Wherein the radiation is emitted by one or more radiation devices located on opposite sides of the at least one film and causes relative movement between the radiation device and the substrate to treat the desired surface, Relates to a method of reducing the resistivity of the at least one film during processing. |
| priorityDate |
2009-06-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |