http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101713799-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-6966 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-0318 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76883 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67201 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67196 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17D1-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F17D1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2011-04-15^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-03-09^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-03-09^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101713799-B1 |
| titleOfInvention | Apparatus and method manufacturing for semiconductor |
| abstract | To a semiconductor manufacturing apparatus and a manufacturing method applicable to a semiconductor metallization process. The semiconductor manufacturing apparatus includes a load lock chamber, at least one process chamber, a transfer chamber, and an antioxidant gas supply unit. The process chamber receives the substrate and processes the annealing process. The transfer chamber transfers the substrate between the load lock chamber and the process chamber. The antioxidant gas supply unit supplies the antioxidant gas to at least one of the transfer chamber and the load lock chamber. |
| priorityDate | 2011-04-15^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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