http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101716085-B1

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filingDate 2016-05-10^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-03-13^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-03-13^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101716085-B1
titleOfInvention Thin film forming method and thin film forming apparatus
abstract The present invention provides a thin film forming method and a thin film forming apparatus capable of forming a thin film having good characteristics. A thin film forming method according to the present invention includes a first step of supplying a first source gas and a second source gas into a reaction chamber, a second step of supplying a second source gas into the reaction chamber, And a second step of increasing the pressure in the reaction chamber in comparison with the pressure in the first step. The thin film is formed on the object to be processed accommodated in the reaction chamber by alternately repeating the first step and the second step a plurality of times.
priorityDate 2012-12-18^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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