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filingDate 2013-06-03^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-03-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-03-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101719856-B1
titleOfInvention Polymer, resist composition and patterning process
abstract [MEANS FOR SOLVING PROBLEMS] A polymer compound containing a repeating unit represented by the general formula (1A) or (1B) and a repeating unit represented by the general formula (2) in response to a high energy ray or heat. (R 1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R 2, R 3, R 4 is a monovalent hydrocarbon group, L represents a single bond or a divalent hydrocarbon group, X represents an alkylene group, Z 1 and Z 2, R 5 represents a halogen or an alkyl group, L 'represents a single bond or a divalent organic group, m represents 0 to 3, n represents an integer of 1 to 2, N is 0 to 2, and M + is a sulfonium cation or an iodonium cation) [Effect] When the polymer compound of the present invention is used as a base resin, it has high sensitivity, high resolution and excellent LWR.
priorityDate 2012-06-04^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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