| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D497-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D311-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2011-10-25^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-03-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-03-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101720351-B1 |
| titleOfInvention |
Resist composition, method of forming resist pattern, novel compound and acid generator |
| abstract |
A resist composition comprising a base component (A) whose solubility in a developer is changed by the action of an acid and an acid generator component (B) which generates an acid by exposure, The acid generator component (B) contains an acid generator (B1) having a group represented by the following general formula (b1-1) in the cation portion. [Chemical Formula 1] |
| priorityDate |
2010-10-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |