http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101739730-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2010-06-25^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-05-26^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-05-26^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101739730-B1 |
| titleOfInvention | Dry film photoresist |
| abstract | The present invention relates to a dry film photoresist. More specifically, the dry film photoresist according to the present invention can be subjected to an exposure process in a state in which a support film is removed, thereby improving the resolution by preventing the exposure effect of the support film from being adversely affected . Particularly, when the dry film photoresist is used for pattern formation, when the laminated dry film photoresist is separated again after the exposure process, the photosensitive resin layer is not damaged or transferred due to the adhesive force between the films, have. |
| priorityDate | 2010-06-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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