http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101791478-B1

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filingDate 2016-06-02^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-10-31^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfbb2b70954469f84445e2a606d77705
publicationDate 2017-10-31^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101791478-B1
titleOfInvention Treating system of waste gas
abstract In particular, the present invention relates to a waste gas treatment system, in particular, a waste gas generated in a semiconductor manufacturing process is reacted with steam together with combustion at a high temperature, a combustion gas generated after combustion is reacted with water to collect harmful substances, A waste gas injection pipe 10 connected to a steam injection pipe 11 at one side for the purpose of enhancing treatment performance by filtering by adsorption and enabling continuous treatment; First and second combustion units (20, 30) for burning offgas using micro-electro-magnetic waves and high-temperature plasma; A cooling unit (40) for cooling the combustion gas; A reservoir portion (50) and a mixing portion (70) for collecting and collecting the combustion gas together with water; A suction part (80) for suctioning the residual gas; A waste gas treatment system is provided.
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priorityDate 2016-06-02^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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