http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101889104-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F224-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F228-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2012-04-09^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-08-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-08-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101889104-B1 |
| titleOfInvention | Resist composition, method of forming resist pattern, and polymeric compound |
| abstract | 1. A resist composition comprising a base component (A) in which the solubility to a developer is changed by the action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the base component (A) -1) and an acid-decomposable group in which the polarity is increased by the action of an acid as a constitutional unit derived from an acrylate ester in which a hydrogen atom bonded to the carbon atom at the? -Position may be substituted by a substituent (Wherein R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms), which comprises the resin component (A1) having the structural unit (a1) |
| priorityDate | 2011-04-12^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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