| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-02-19^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2019-02-19^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101949688-B1 |
| titleOfInvention |
Novel polymers and photoresist compositions |
| abstract |
(i) at least one photoacid generator moiety covalently bonded and (ii) at least one photoacid-labile moiety, wherein the at least one photoacid generator moiety is a moiety that is a member of the at least one photoacid- A polymer is provided. The preferred polymers of the present invention are suitable for use in photoresists imaged at short wavelengths, such as sub-200 nm, particularly at 193 nm. |
| priorityDate |
2010-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |