http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101967626-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2014-01-08^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-04-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-04-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101967626-B1 |
| titleOfInvention | Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film |
| abstract | A negative resist composition capable of forming a pattern excellent in resolution (for example, resolution, pattern shape, line edge roughness (LER), post exposure bake (PEB) temperature dependency and post exposure line width (PED) A mask, a pattern forming method, and a mask blank having a resist film are provided. The negative resist composition of the present invention is a negative resist composition which comprises an onium salt compound (A) containing a nitrogen atom in a cation portion, a compound (B) which generates an acid upon irradiation of an actinic ray or radiation, and a compound containing an acid crosslinkable group C). |
| priorityDate | 2013-01-10^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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