http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102055788-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02019 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30608 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
| filingDate | 2016-11-25^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-12-13^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-12-13^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102055788-B1 |
| titleOfInvention | Etching compositions and methods for using same |
| abstract | The present invention comprises about 25 to 86% by weight of water; About 0 to about 60 weight percent of a water miscible organic solvent; A base comprising from about 1 to about 30 weight percent of a quaternary ammonium compound; About 1 to about 50% by weight of an amine compound selected from the group consisting of secondary amines, tertiary amines, and mixtures thereof; About 0 to about 5 weight percent of a buffer; A composition useful for etching a semiconductor substrate, comprising about 0 to about 15 weight percent corrosion inhibitor, and a method of using the composition. |
| priorityDate | 2015-11-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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