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filingDate 2019-03-04^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2020-01-06^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102062561-B1
titleOfInvention Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device
abstract A photoresist composition comprising an acid-sensitive polymer and a photoacid generator compound having formula (I): In the formula, EWG, Y, R, and M + are the same as described herein.
priorityDate 2015-12-31^^<http://www.w3.org/2001/XMLSchema#date>
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