http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102088840-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
| filingDate | 2013-09-10^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-04-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-04-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102088840-B1 |
| titleOfInvention | ETCHANT COMPOSITION FOR NICKEL-BASED METAL LAYER AND TiN |
| abstract | The present invention, based on the total weight of the composition, a) 5 to 60% by weight of one or more components selected from the group consisting of nitric acid and sulfonic acids, b) 0.1 to 40% by weight of hydrogen peroxide, and c) containing the remaining amount of water Provided is a composition for etching a nickel-based metal film and TiN. |
| priorityDate | 2013-09-10^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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