http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102098002-B1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_799858790a0d932d2bf525d1f2324ad6 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
filingDate | 2018-10-19^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-04-07^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d5f63ce724a7db3f9b783ec21f4c46c |
publicationDate | 2020-04-07^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102098002-B1 |
titleOfInvention | Apparatus for processing substrate |
abstract | A substrate processing apparatus using plasma is provided for uniformly controlling an electric field in a radial direction. The substrate processing apparatus includes a first electrode electrically connected to a first power source; A second electrode electrically connected to a second power source different from the first power source; A spacer formed between the first electrode and the second electrode and made of a dielectric; A plasma excitation region in which plasma is formed as a space between the first electrode and the second electrode; And a gas supply module for supplying gas for plasma formation to the plasma excitation region, wherein the first electrode includes a first surface facing the plasma excitation region, and has a plurality of centers on the first surface. The first circular groove of is formed. |
priorityDate | 2018-10-19^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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