http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102154250-B1

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
filingDate 2013-09-30^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-09-09^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-09-09^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102154250-B1
titleOfInvention Polishing composition
abstract It is to provide a polishing composition capable of sufficiently maintaining a high polishing rate for a barrier layer and an insulating film, and suppressing the occurrence of surface defects such as erosion and protrusion. A polishing composition used for polishing an object to be polished having a barrier layer, a metal wiring layer, and an insulating film, and is a polishing composition containing an abrasive grain, an oxidizing agent, a metal anticorrosive agent, a pH adjusting agent, and water. The aspect ratio is 1.22 or less, and in the particle size distribution obtained by the laser diffraction scattering method of the abrasive grains, the particle diameter D90 when the cumulative particle weight reaches 90% of the total particle weight from the fine particle side and the total particles of all particles It is a polishing composition in which the ratio D90/D10 of the particle diameter D10 when reaching 10% by weight is 1.5 or more.
priorityDate 2012-11-02^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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