http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102171725-B1

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filingDate 2014-05-15^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-10-29^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-10-29^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102171725-B1
titleOfInvention Enhanced plasma source for a plasma reactor
abstract Embodiments of an apparatus with an improved coil antenna assembly capable of providing an enhanced plasma in a processing chamber are provided. The improved coil antenna assembly enhances position control of the plasma location within the plasma processing chamber and can be used in etching, deposition, implantation, and thermal processing systems, among other applications where control of the plasma location is desirable. In one embodiment, an electrode assembly configured for use in a semiconductor processing apparatus includes an RF conductive connector, and a conductive member having a first end electrically connected to the RF conductive connector, the conductive member outwardly and vertically from the RF conductive connector. Is extended.
priorityDate 2013-06-17^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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