http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102171725-B1
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-4645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2001-4645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2001-4667 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-4652 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-4652 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
filingDate | 2014-05-15^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-10-29^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-10-29^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102171725-B1 |
titleOfInvention | Enhanced plasma source for a plasma reactor |
abstract | Embodiments of an apparatus with an improved coil antenna assembly capable of providing an enhanced plasma in a processing chamber are provided. The improved coil antenna assembly enhances position control of the plasma location within the plasma processing chamber and can be used in etching, deposition, implantation, and thermal processing systems, among other applications where control of the plasma location is desirable. In one embodiment, an electrode assembly configured for use in a semiconductor processing apparatus includes an RF conductive connector, and a conductive member having a first end electrically connected to the RF conductive connector, the conductive member outwardly and vertically from the RF conductive connector. Is extended. |
priorityDate | 2013-06-17^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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