| abstract |
TECHNICAL FIELD The present disclosure relates to a solid-state imaging device capable of improving sensitivity while suppressing deterioration of color mixture, a method for manufacturing the same, and an electronic device. A solid-state imaging device includes an antireflection portion having a moth-eye structure provided at the light-receiving surface side interface of the photoelectric conversion region of each pixel arranged two-dimensionally, and a light blocking portion between pixels provided below the interface of the antireflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the light blocking portion between pixels has a trench structure in which the semiconductor region of the pixel boundary is dug in the depth direction. The technology of the present disclosure can be applied to, for example, a backside-illuminated solid-state imaging device or the like. |