http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102329586-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2014-11-21^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-11-22^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-11-22^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102329586-B1 |
| titleOfInvention | Positive-type photosensitive resin composition and cured film prepared therefrom |
| abstract | The present invention relates to a positive photosensitive resin composition and a cured film prepared therefrom, wherein the photosensitive resin composition comprises (A) a siloxane polymer comprising at least one structural unit derived from a silane compound represented by the following formula (1), ( B) By including an epoxy compound and (C) a 1,2-quinonediazide compound, high transparency, which is an advantage of a composition containing a siloxane polymer, is maintained, and chemical resistance is improved at the same time, and excellent stability in post-processing A cured film can be provided. |
| priorityDate | 2014-11-21^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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