http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980087250-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1998-05-21^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-12-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980087250-A |
| titleOfInvention | Radiation-sensitive resin composition |
| abstract | The present invention provides (A) at least one compound selected from the group consisting of (a-1) hexafluoropropylene, (a-2) unsaturated carboxylic acid and unsaturated carboxylic anhydride, and (a-3) above a fluorine-containing copolymer of the component (a-1) and an unsaturated compound copolymerizable with the component (a-2), (B) an acid generating compound that generates an acid upon irradiation with radiation, (C) a crosslinkable compound, and (D) It is related with the radiation sensitive resin composition which consists of an organic solvent in which the said (A) component, (B) component, and (C) component melt | dissolve.n n n The radiation-sensitive resin composition according to the present invention can be developed with an alkaline aqueous solution, and thus has high resolution and high sensitivity, and has excellent properties such as heat resistance, solvent resistance, transparency, and low dielectric properties, which are difficult to realize simultaneously with these properties. The phase thin film can be easily formed. |
| priorityDate | 1997-05-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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