http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990045072-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30 |
| filingDate | 1998-11-06^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1999-06-25^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19990045072-A |
| titleOfInvention | Thermal Plasma Annealing System and Annealing Process |
| abstract | The present invention relates to a thermal plasma annealing system comprising radiation irradiation means for irradiating a thin film formed on a substrate by heat or radiation emitted from the thermal plasma. Therefore, according to the present invention, a relatively high temperature sensitive material such as glass can be used as a substrate, a mass annealing treatment can be performed in a mass production system, and a thermal plasma annealing system suitable for obtaining a constant annealing quality can be implemented. |
| priorityDate | 1997-11-06^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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