http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990045397-A

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filingDate 1998-11-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1999-06-25^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-19990045397-A
titleOfInvention Resist pattern forming method and positive resist composition used in this method
abstract A positive resist composition comprising an active agent capable of generating an acid or radical, although not sensitive to patterned exposure wavelengths, is coated on a substrate to form a resist film, and after development, an acid or radical is generated from the active agent to cure A method of forming a resist pattern having excellent heat resistance, the method being used in the method, and including a alkali-soluble novolak resin, a quinonediazide-based radiation-sensitive agent, an active agent and a crosslinking agent, and a patterned exposure and development, Hole pattern, which is a fine positive resist pattern, comprising irradiating the obtained resist pattern with light whose wavelength is shorter than that used for patterned exposure, and then heating the irradiated pattern at a temperature sufficient to swell the resist pattern Provides a method of forming).
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priorityDate 1997-11-17^^<http://www.w3.org/2001/XMLSchema#date>
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