http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990045397-A
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate | 1998-11-16^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 1999-06-25^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-19990045397-A |
titleOfInvention | Resist pattern forming method and positive resist composition used in this method |
abstract | A positive resist composition comprising an active agent capable of generating an acid or radical, although not sensitive to patterned exposure wavelengths, is coated on a substrate to form a resist film, and after development, an acid or radical is generated from the active agent to cure A method of forming a resist pattern having excellent heat resistance, the method being used in the method, and including a alkali-soluble novolak resin, a quinonediazide-based radiation-sensitive agent, an active agent and a crosslinking agent, and a patterned exposure and development, Hole pattern, which is a fine positive resist pattern, comprising irradiating the obtained resist pattern with light whose wavelength is shorter than that used for patterned exposure, and then heating the irradiated pattern at a temperature sufficient to swell the resist pattern Provides a method of forming). |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101323201-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100831847-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160148167-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100557599-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000005750-A |
priorityDate | 1997-11-17^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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